0010-59787
PublishedPECVD Ceramic Heater / Reactor
Applied MaterialsInstrumentation & SensorsElectric ActuatorIndustrial supply
Applied Materials 0010-59787 PECVD (Plasma Enhanced Chemical Vapor Deposition) reactor / ceramic heater used as a deposition chamber to deposit thin films onto substrates for electronic devices. Integrated power, vacuum and gas-delivery modules with automated loading.
Wholesale supply0010-59787
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Product identity6 fields
Item namePECVD Ceramic Heater / Reactor
Item number / code0010-59787
BrandApplied Materials
Product lineIndustrial supply
CategoryInstrumentation & Sensors
Product typeElectric Actuator
Technical data13 rows
TypePECVD
AMAT 0010-59787PECVD reactor is a deposition chamber designed to deposit thin films or layers onto substrates used in various electronic devices and systems. The system employ
Automation and IntegrationThe reactor is equipped with an automated loading and unloading chamber, as well as integrated power, vacuum, and gas delivery modules. This design minimizes s
Chamber DesignEasy-to-use chamber design enables excellent deposition uniformity and consistent layer thickness across the substrate surface
Deposition ProcessLow-pressure, low-temperature CVD (LP-CVD)
Flexible Processing ParametersA wide process window allows users to adjust temperature, pressure, and other parameters based on specific deposition needs. This flexibility supports the prod
High Process TemperatureThe chamber can achieve higher process temperatures than traditional thermal CVD processes, enabling the production of higher quality thin films
Integrated ModulesPower, vacuum, and gas delivery system
LP-CVD ProcessThe reactive gas delivery system utilizes low-pressure, low-temperature CVD to deposit the required thin film material onto the substrate surface. The LP-CVD p
Operating WindowAdjustable temperature, pressure, and process parameters
Process ControlEquipped with user-friendly controllers, the system offers extensive data recording and process control
Process GasSupports multiple reactive gases
Reactor TypePECVD (Plasma Enhanced Chemical Vapor Deposition)
Reference numbers1 public
AMAT0010-59787