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Applied Materials (AMAT) MCA ESC heater assembly for 300mm wafers, used in PVD/Endura semiconductor process chambers to heat the electrostatic chuck.
Applied Materials 0010-28715 high-performance heater used for temperature control in Electrostatic Chuck (ESC) systems during semiconductor manufacturing. Provides uniform heating and precise temperature regulation, withstanding temperatures up to 300 degrees C.
Applied Materials 0041-75950 chemical vapor deposition (CVD) reactor, a temperature-controlled chamber for thin-film deposition of materials such as silicon nitride and silicon dioxide on substrates. Operating temperature range room temperature to 1000 degrees C.