CVD Reactor

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0041-75950

CVD ReactorApplied Materials

Chemical Vapor Deposition (CVD) Reactor

Applied Materials 0041-75950 chemical vapor deposition (CVD) reactor, a temperature-controlled chamber for thin-film deposition of materials such as silicon nitride and silicon dioxide on substrates. Operating temperature range room temperature to 1000 degrees C.

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CVD Reactor

Chemical Vapor Deposition (CVD) Reactor