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Applied Materials 0010-59787 PECVD (Plasma Enhanced Chemical Vapor Deposition) reactor / ceramic heater used as a deposition chamber to deposit thin films onto substrates for electronic devices. Integrated power, vacuum and gas-delivery modules with automated loading.
Applied Materials 0010-59788 is a 300mm ceramic producer heater used in semiconductor manufacturing equipment, offering high precision and stability and a long service life in harsh fab environments.
Applied Materials 0010-59798 ceramic heater with a silicon carbide (SiC) heating element, operating up to 1200 degrees C with uniform heating, fast heat-up and long service life. Used with semiconductor manufacturing equipment.
Gestra LRG 16-4 salinometer (conductivity electrode). Service pressure PN 40, 32 bar at 238°C; measuring/installation lengths 100-1200 mm; max ambient temperature 70°C.